PVD sputtering coating machine
DOI:
https://doi.org/10.46842/ipn.cien.v25n2a03Keywords:
material deposition, PVD, plasma, materials technologyAbstract
This work will address the design of a small-scale machine for sputtering tanks (PVD) for student use. This from the generation and focusing of plasma in a controlled way in a vacuum system with the support of a high voltage system. Through this design it was possible to make a visible aluminum deposit on glass substrates during a simple round of tests. This type of system can open the doors to future projects in materials technology, as well as research in areas such as optics or tribology at the university level.
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